RCA Cleaning Equipment
Product Name: RCA Cleaning Equipment
Function: Used for the removal of LPCVD/PECVD deposited polysilicon
Process Flow: Deposition removal→Post-cleaning→Pickling→Post-cleaning
Features: Supports MES, RFID, and optional online weighing functions; one-key online washing and solution replacement for simple and quick fluid exchange; process tank circulation volume adjustable according to process requirements; compatible with additives from various brands; thorough removal of deposition and thorough cleaning.
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Product Name |
RCA Cleaning Equipment |
|
Model |
KSRCA |
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Route Application |
TOPCON |
|
Function |
Used for the removal of LPCVD/PECVD deposited polysilicon |
|
Process Flow |
Deposition removal→Post-cleaning→Pickling→Post-cleaning |
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Compatible Wafer |
182x182mm, compatible with various sizes of 18X-230 silicon wafers |
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Cassette Number |
4, 6 cassettes |
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Capacity |
182: ≥16000 pcs/hour; 210: ≥12500 pcs/hour |
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Breakage Rate |
Breakage rate <0.01% (Silicon wafer thickness ≥130um) |
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Power Consumption/ Voltage |
295KW/ 380V 50Hz 3-phase 5-wire system |
|
Features |
Supports MES, RFID, and optional online weighing functions; one-key online washing and solution replacement for simple and quick fluid exchange; process tank circulation volume adjustable according to process requirements; compatible with additives from various brands; thorough removal of deposition and thorough cleaning. |